Low-k
An ideal characteristic in dielectrics, copper wire interconnects and chips which refers to the crosstalk or charge build up in the circuitry of chips. As speed increases, unwanted charges and capacitance builds up in the wiring. This creates electrical 'crosstalk' that adveresly affects the performance of the chip.
Low-k dielectrics have very low electrical conductance and thus are good insulators between wires, reducing electrical leakage and parasitic capacitance and enabling faster switching speeds and lower heat dissipation.
The k refers to the dielectric constant. For example that of SiO2 is k= 3.9 and by doping it with flourine, this is lowered to 3.5 to produce flourinated silica glass.
References
Semiconductors are materials whose electronic properties can be controlled by adding small amounts of impurities to them.
